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High-Temperature Furnace for Annealing, Oxidation, Polymid and Other Thermal Processes - PEO-604
QUARTZ TUBE FURNACE

HIGH-TEMPERATURE FURNACE FOR ANNEALING, OXIDATION, POLYIMID AND OTHER THERMAL PROCESSES

PEO-604

HIGH-TEMPERATURE FURNACE FOR ANNEALING, OXIDATION, POLYIMID AND OTHER THERMAL PROCESSES.

The PEO-604 quartz tube furnace offers outstanding performance and versatility for demanding thermal applications. It is perfectly suited for research, pilot production and series production and processes up to 50 wafers per process run with a maximum diameter of 200 mm. The high-temperature furnace guarantees contamination-free processing thanks to the easily exchangeable quartz liners, which prevent cross-contamination during different processes. With a temperature increase of up to 1,000°C in just 25 minutes, the oven offers fast process times and precise control. The PEO-604 also achieves a high vacuum value of up to 5 x 10-⁶ mbar and an oxygen concentration of < 1.0 ppm with purified N₂, ensuring the highest process quality. With 100 adjustable program steps and the ability to use the furnace for various applications such as annealing, oxidation and silicon alloys, the PEO-604 is a flexible and reliable solution for any demanding thermal process requirement.

High-Temperature Furnace for Annealing, Oxidation, Polymid and Other Thermal Processes - PEO-604

Facts & Options about our PEO-604 High Temperature Furnace

HIGHLIGHTS PEO-604

  • Floor space saving due to small foot print
  • Energy saving by energy consumption in standby mode
  • Max. 50 wafers / process run 
  • Up to Ø 200 mm wafers
  • No cross-contamination between different processes with easily exchangeable liners
  • Temperature Ramping:
    • Up to 1.000°C  within 25 minutes (empty chamber)
    • Down to < 100°C in less than 60 minutes (empty chamber)
    • 1K per 100 minutes (slowest ramping speed up/down)
  • High vacuum down to 5 x 10-6 mbar 
  • Oxygen < 1.0 ppm with purified N2
  • 100 steps / program

COMMON APPLICATIONS PEO-604

  • Annealing:
    • Inert / Atmosphere
    • Hydrogen
    • High vacuum
  • Wet / Dry Oxidation
  • SiAl / SiAu / SiMo alloying
  • Polyimid process

TECHNICAL DATA PEO-604

depending on system configuration/optionals

  • Footprint
    •  1750 x 835 x 2355 mm (LxWxH)
  • Weight
    •  ca. 700 kg (minimum configuration)
  • Inner Quartz tube
    •  230 mm (9”)
  • Maximum Product Temperature
    •  1.000°C continuously
    •  1.100°C continuously (optional)
  • Flat Zone
    •  Flat zone 25 wafers / 50 wafers half pitch

OPTIONS PEO-604

  • Easily exchangeable liners
  • High Vacuum
  • H2 annealing
  • 5 heater zone tuning for best possible 3D temperature uniformity​
  • Customized quartz ware
  • Dry pumps
  • DI water bubbler

Information Request PEO-604