PEO-604
MULTIPURPOSE FAST RAMPING FURNACE
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photo: www.foto-filep.de
Quick look at: PEO-604
MULTIPURPOSE FAST RAMPING FURNACE
Since 1982 ATV is manufacturing the multipurpose fast ramping furnaces PEO series with single quartz tube. It was initially developed for thick film paste firing. Since that a large variety of new and different processes and applications was and is still being added. ATV applies its PEO series successfully in semiconductor market segment.
The PEO series is ideal tool for R&D purposes, pilot line and mass production. It can be applied easily for new unique and sophisticated process development as well low to medium volume production applications. This multipurpose furnace has several key aspects integrated and can handle wafers
up to 200mm.
Next to floor space saving advantages the PEO also has close to Zero energy usage in ambient stand-by. Another unique aspect of the system is the multi process capability when using our easily exchangeable liners. To reach the optimal temperature uniformity ATV uses 14 Kanthal heating elements which are positioned around, at the front and at the back side of the process tube and are PID controlled.
Facts PEO-604
Technical information and figures
Technical Data PEO-604
depending on system configuration
Footprint:
1.780 x 834 x 2.345 mm (LxWxH)
Weight:
475 kg (minimum configuration)
Inner Quartz tube:
230 mm (9”)
Maximum Product Temperature:
1.000°C continuously
1.100°C continuously, optional configuration
Flat Zone:
Flat Zone 25 wafers / 50 wafers half Pitch
Common Applications PEO-604
depending on system configuration
Annealing:
-
Inert/Atmosphere
-
Hydrogen
-
High vacuum
Wet/Dry Oxidation
SiAl/SiAu/SiMo alloying
Features PEO-604
depending on system configuration
depending on optionals
Floor space saving by small foot print
Energy saving by close to zero energy consumption at ambient standby
Max 50 wafers/process run
Up to 200mm Ø wafers
Multiple processes by easily exchangeable quartz In Liners
Temperature Ramping:
-
Up to 1.000°C within 25 minutes (empty chamber)
-
Down to < 100°C in less than 60 minutes
-
1K per 100 minutes (slowest ramping speed up/down)
Low temperature processing with gas preheating
high vacuum down to 5 x 10-6 mbar
He leak rate: < 5 x 10-9 mbar l/s
O2 = N2 supply quality
100 steps/program
Options PEO-604
Additional values depending on application and final configuration
Easily exchangeable In Liners for multiple processes in original process tube
H2 annealing with quartz glass process chamber surrounded by N2 atmosphere
5 heater zone turning for best possible 3 D temperature uniformity
O2/H2O monitoring
Customized quartz ware
Dry pumps
DI water bubbler
Turbo pump
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