Quick look at: PEO-604


Since 1982 ATV is manufacturing the multipurpose fast ramping furnaces PEOs series with single quartz tube. It was initially developed for thick film paste firing. Since that a large variety of new and different processes and applications was and is still being added. ATV applies its PEO series successfully also in semiconductor market segment. 


The PEO series is ideal tool for R&D purposes, pilot line and mass production. It can be applied easily for new unique and sophisticated process development as well low to medium volume production applications. This multipurpose furnace has several key aspects integrated and can handle wafers up to 200mm.


Next to floor space saving advantages the PEO also has Zero energy usage in ambient stand-by. Another unique aspect of the system is the multi process capability when using our easy exchangeable Liners. To reach the optimal temperature uniformity ATV uses 14 Kanthal heating elements which are positioned around, at the front and on back side the process tube and are PID controlled.


Facts PEO-604

Technical information and figures

Technical Data PEO-604


1.780 x 834 x 2.345 mm (LxWxH)



475 kg

Inner Quartz tube: 

230 mm (9”)

Standard Product Temperature:    

1.000°C/1.100°C continuously

Flat Zone:    

50 wafers / 100 wafers half pitch

Power connection:    

3Phases, 230/400V, 32/63A, 21/42 kW

Features PEO-604

Floor space saving by small foot print

Energy saving by zero energy consumption at ambient standby

Max 100 wafer/process run 

Up to 200mm Ø wafers

Multiple processes by easily exchangeable quartz In Liners

Temperature Ramping:

  • Up to 1.000°C  within 15 minutes

  • Down to < 100°C in less than 60 minutes

  • 1K per 100 minutes (slowest ramping speed up/down)

Max. 1.100°C continuous processing

Temperature range  250°C to 1.100°C  

Low temperature processing with gas preheating

Ultimate vacuum < 5 x 10-6 mbar

He leak rate: < 5 x 10-9 mbar l/s 

O2 = N2 supply quality

100 steps/program

Common Applications PEO-604


Si3N4, Poly Si

Si Epitaxy 


Carbon Nanotubes, Si Nanowires, Graphene

Gas/Solid Source Diffusion

Wet/Dry Oxidation

Al Oxidation for VECSEL

Trans LC

SiAl/SiAu/SiMo alloying


  • Inert/Atmosphere

  • Hydrogen

  • High vacuum

Post Implant Annealing

Low K

Polyimide, Curing/Baking

LTCC Sintering, Thick film paste sintering 


Options PEO-604

Additional values

Easily exchangeable In Liners for multiple LPCVD/diffusion/ alloying/annealing processes in original process tube

H2 annealing with quartz glass process chamber surrounded by N2 atmosphere

5 heater zone turning for best possible 3 D temperature uniformity​

O2/H2O monitoring

Porous SiC ceramics for LTCC sintering

Customized quartz ware

Dry pumps

Heavy duty door bell jar carrying 25 kg

DI water bubbler

DI water steamer

H2 torch

Polyimide vapor trap

Turbo pump

LPCVD vacuum pumps

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ATV-Technologie GmbH

Entwicklung und Vertrieb von Maschinen und Geräten für die Mikroelektronik

Johann-Sebastian-Bach-Str. 38

85591 Vaterstetten


Phone: +49 (0)8106-3050-0

Fax: +49 (0)8106-3050-99

info {at}