Quick look at: PEO-604


Since 1982 ATV is manufacturing the multipurpose fast ramping furnaces PEO series with single quartz tube. It was initially developed for thick film paste firing. Since that a large variety of new and different processes and applications was and is still being added. ATV applies its PEO series successfully in semiconductor market segment. 


The PEO series is ideal tool for R&D purposes, pilot line and mass production. It can be applied easily for new unique and sophisticated process development as well low to medium volume production applications. This multipurpose furnace has several key aspects integrated and can handle wafers

up to 200mm.


Next to floor space saving advantages the PEO also has close to Zero energy usage in ambient stand-by. Another unique aspect of the system is the multi process capability when using our easily exchangeable liners. To reach the optimal temperature uniformity ATV uses 14 Kanthal heating elements which are positioned around, at the front and at the back side of the process tube and are PID controlled.


Facts PEO-604

Technical information and figures

Technical Data PEO-604

depending on system configuration


1.780 x 834 x 2.345 mm (LxWxH)



475 kg (minimum configuration)

Inner Quartz tube: 

230 mm (9”)

Maximum Product Temperature:    

1.000°C continuously

1.100°C continuously, optional configuration

Flat Zone:    

Flat Zone 25 wafers / 50 wafers half Pitch

Features PEO-604

depending on system configuration

depending on optionals 

Floor space saving by small foot print

Energy saving by close to zero energy consumption at ambient standby

Max 50 wafers/process run 

Up to 200mm Ø wafers

Multiple processes by easily exchangeable quartz In Liners

Temperature Ramping:

  • Up to 1.000°C  within 25 minutes (empty chamber)

  • Down to < 100°C in less than 60 minutes

  • 1K per 100 minutes (slowest ramping speed up/down)

Low temperature processing with gas preheating

high vacuum down to 5 x 10-6 mbar 

He leak rate: < 5 x 10-9 mbar l/s 

O2 = N2 supply quality 

100 steps/program

Common Applications PEO-604

depending on system configuration


  • Si3N4, Poly Si 

Carbon Nanotubes, Si Nanowires, Graphene

Gas/Solid Source Diffusion

Wet/Dry Oxidation

Oxidation for VCSEL

SiAl/SiAu/SiMo alloying


  • Inert/Atmosphere

  • Hydrogen

  • High vacuum

Post Implant Annealing

Polyimide, Curing/Baking

LTCC Sintering, Thick film paste sintering 


Options PEO-604

Additional values depending on application and final configuration

Easily exchangeable In Liners for multiple LPCVD/diffusion/ alloying/annealing processes in original process tube

H2 annealing with quartz glass process chamber surrounded by N2 atmosphere

5 heater zone turning for best possible 3 D temperature uniformity​

O2/H2O monitoring

Porous SiC ceramics for LTCC sintering

Customized quartz ware

Dry pumps

Heavy duty door bell jar carrying 25 kg

DI water bubbler

DI water steamer

H2 torch

Polyimide vapor trap

Turbo pump

LPCVD vacuum pumps


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