PEO-601

MULTIPURPOSE FAST RAMPING FURNACE

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Quick look at: PEO-601

MULTIPURPOSE TABLE TOP FAST RAMPING FURNACE

Since 1982 ATV is manufacturing the multipurpose table top fast ramping furnaces PEOs series with single quartz tube. It was initially developed for thick film paste firing. Since that a large variety of new and different processes and applications was and is still being added. ATV applies its PEO series successfully also in semiconductor market segment. 

The PEO series is ideal tool for R&D purposes. It can be applied easily for new unique and sophisticated process development as well low to medium volume production applications. This multipurpose furnace has several key aspects integrated and can handle wafers up to 100mm.

Next to floor space saving advantages the PEO also has Zero energy usage in ambient stand-by. Another unique aspect of the system is the multi process capability when using our easy exchangeable Liners. To reach the optimal temperature uniformity ATV uses 14 Kanthal heating elements which are positioned around, at the front and on back side the process tube and are PID controlled

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Facts PEO-601

Technical information and figures

Technical Data PEO-601

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Footprint:     

710 x 650 x 450mm (LxWxH)

Weight: 

47kg

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Inner Quartz tube: 

112mm (4-1/2”)

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Standard Product Temperature:    

1.000°C/1.100°C continuously

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Flat Zone:    

Up to 40 wafers, 100mm diameter

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Power connection:    

3Phases, 230/400V, 16A, max.7kW

Common Applications PEO-601

Solid Source Diffusion

Wet/Dry Oxidation

SiAl/SiAu/SiMo alloying

Annealing:

• Inert/Atmosphere

Polyimide, Curing/Baking

LTCC Sintering, Thick film paste sintering 

Features PEO-601

Floor space saving by small foot print

Energy saving by zero at ambient standby

Max 40 wafer/process run 

Up to 100mm wafers

Easily exchangeable quartz In Liners

Temperature Ramping:

• Up to 1.000°C  within 15 minutes

• Down to < 100°C in less than 60 minutes

• 1K per 100 minutes (slowest ramping speed)

Temperature range 150°C to 1.100°C  

Low temperature processing by gas preheating

Ultimate vacuum < 5 x 10-1 mbar

He leak rate: < 5 x 10-8 mbar l/s 

O2 < 5 ppm

100 steps/program

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Options PEO-601

Additional values

DI water bubbler

Vacuum annealing

Additional gas line

High temperature (1100°C)

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Gas supply safety interface

Vacuum pump

Wafer carriers

Quartz dummy wafer

Quartz In-Liner