PEO-601
MULTIPURPOSE FAST RAMPING FURNACE
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Quick look at: PEO-601
MULTIPURPOSE TABLE TOP FAST RAMPING FURNACE
Since 1982 ATV is manufacturing the multipurpose table top fast ramping furnaces PEO series with single quartz tube. It was initially developed for thick film paste firing. Since that a large variety of new and different processes and applications was and is still being added. ATV applies its PEO series successfully also in semiconductor market segment.
The PEO series is ideal tool for R&D purposes. It can be applied easily for new unique and sophisticated process development as well low to medium volume production applications. This multipurpose furnace has several key aspects integrated and can handle wafers up to 100mm.
Next to floor space saving advantages the PEO also has close to Zero energy usage in ambient stand-by. Another unique aspect of the system is the multi process capability when using our easily exchangeable liners. To reach the optimal temperature uniformity ATV uses 14 Kanthal heating elements which are positioned around, at the front and on back side the process tube and are PID controlled
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Facts PEO-601
Technical information and figures
Technical Data PEO-601
depending on system configuration
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Footprint:
710 x 650 x 450mm (LxWxH)
Weight:
47kg (minimum configuration)
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Inner Quartz tube:
112mm (4-1/2”)
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Maximum Product Temperature:
1.000°C continuously
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Flat Zone:
Up to 40 wafers, 100mm diameter
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Power connection:
3Phases, 230/400V, 16A, max.7kW
Common Applications PEO-601
depending on system configuration
Solid Source Diffusion
Wet/Dry Oxidation
SiAl/SiAu/SiMo alloying
Annealing:
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Inert/Atmosphere
Polyimide, Curing/Baking
LTCC Sintering, Thick film paste sintering
Features PEO-601
depending on system configuration
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Floor space saving by small foot print
Energy saving by close to zero at ambient standby
Max 40 wafer/process run
Up to 100mm wafers
Easily exchangeable quartz In Liners
Temperature Ramping:
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Up to 1.000°C within 25 minutes (empty chamber)
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Down to < 100°C in less than 60 minutes
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1K per 100 minutes (slowest ramping speed)
Low temperature processing by gas preheating
100 steps/program

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Options PEO-601
Additional values
DI water bubbler
Vacuum annealing
Additional gas line
High temperature (1100°C)
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Gas supply safety interface
Vacuum pump
Wafer carriers
Quartz dummy wafer
Quartz In-Liner